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Artwork Systems Shows Products at Labelexpo 2006

PRESS RELEASE

GHENT, BELGIUM—Artwork Systems will show its expanded product line for label and packaging markets at the upcoming Labelexpo Americas 2006, September 11-14, 2006, at the Donald E. Stevens Convention Center in Rosemont, IL. Additionally, Mike Rottenborn, VP of technical marketing, will be a featured speaker at the September 12 Labelexpo conference session, “Success with prepress—completing the digital workflow.”

Artwork Systems will feature the newest Nexus 8.3 comprehensive high-end workflow solution; Odystar 2.5 for prepress workflow management; PA:CT (Packaging:Certified Technology) for secure, trackable PDF processing in packaging applications; Neo for quick and efficient editing of native PDF files; Concentric Screening, a halftone dot printing technology; and WebWay 4.0, for Internet collaboration with remote users.

See artwork-systems.com.



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